Case Studies

Three Reference Deployments

Corning. KLA. UCIe. Three flagship integrations that prove the Genesis design-to-yield platform on glass substrate chiplet packaging.

Partner
Corning

Eagle XG Reference Design Kit

First drop-in PDK for glass TGV

Problem

Corning sells Eagle XG glass for advanced packaging, but customers cannot predict TGV impedance accurately. The standard coaxial approximation is wrong by ~55% — designers either over-engineer or fail at integration.

Approach

Genesis BEM solver calibrated against 6 in-scope coaxial-TGV papers (4.0% in-scope mean abs error), driven by 995 active curated unique Touchstone S2P assets in a 2,480-entry registry covering golden TGV geometries and buyer kits. The kit ships as a single YAML config that compiles to GDSII in under one second.

Result

A drop-in design kit covering UCIe @ 32 GT/s, DDR5 @ 6.4 Gbps, PCIe Gen6, and 400G Ethernet. Each interface comes with pre-validated Touchstone, eye diagrams, and a one-page signoff brief.

BEM accuracy
4.0% in-scope mean abs error
Compile time
< 1 s
Touchstone assets
995
Reference interfaces
4
Artifacts
  • kit_spec.md (full PDK manifest)
  • 995 active curated unique S2P assets
  • demo_corning_5min.py output JSON
  • BEM accuracy report vs IEEE reference set
Status: Internal validation. Customer testimonial pending first deployment.
Partner
KLA

Archer Overlay → Yield Integration

First commercial overlay-to-yield bridge

Problem

KLA Archer overlay metrology produces dx,dy displacement maps for every wafer, but no commercial tool maps those measurements directly to bonding yield. Engineers eyeball trends and burn weeks of pilot wafers before catching drift.

Approach

Genesis extracts a correlation_length parameter from the Archer dx,dy maps, then runs Bayesian Normal-Normal calibration. A 10K-campaign DOE proves that just 10 wafers are enough to drive the correlation_length confidence interval below 20µm.

Result

First overlay-to-yield bridge in production. Convergence in 10 wafers vs typical 100+ for fingerprinting approaches. A new ramping fab can establish a yield model in one shift.

Wafers to converge
10
DOE samples
10,000
CI target
< 20 µm
Yield mean
85.9%
Artifacts
  • 3 Archer CSV scenarios (low / mid / high drift)
  • calibration_doe_10k.json (10,000-wafer DOE)
  • demo_kla_calibration.py output
  • Bayesian Normal-Normal posterior plots
Status: Internal validation.
Partner
UCIe Working Group

UCIe Glass Interposer Verification

Five-stage signoff flow for 32 GT/s glass

Problem

UCIe @ 32 GT/s on glass substrates has zero EDA tool support. Engineers fly blind: there is no signoff path from layout through impedance, isolation, yield, thermal, and EM verification.

Approach

Full digital_twin pipeline — impedance synthesis (PROV 7) → isolation closed-loop (PROV 8) → yield (PROV 9) → thermal (PROV 3) → EM verification. Each stage has a hard pass/fail gate that produces a per-design GO / NO-GO verdict.

Result

A 5-stage verified design flow. 0 of 20 alternative isolation approaches beat the closed-loop synthesis (24.6 dB gap) — the closed loop is the only path that meets UCIe isolation targets on glass.

Stages
5
Designs benchmarked
10
Alts beaten
20 / 20
Isolation gap
24.6 dB
Artifacts
  • digital_twin_10.json benchmark (10 designs)
  • prov8_vs_alts_20.json (closed loop vs 20 alts)
  • demo_ucie_on_glass.py output
  • GO/NO-GO verdict reports
Status: Internal validation.

Case studies above are based on internal validation with production-grade demo scripts and benchmark suites. Live customer testimonials are available under NDA. Reach out to schedule a reference call.

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